Show Notes
The emergence of user-friendly AI agents is creating massive new hardware demand, which in turn is forcing the semiconductor industry into a complex, multi-year transition to High NA EUV lithography and an entirely new 12-inch photomask standard. Austin Lyons and Vik Sekar unpack the physics and economics of ASML's move to High NA, explaining why it necessitates a shift from 6-inch to 6x12-inch masks and what this means for the timelines of TSMC, Intel, and Samsung. "This is where you have to...
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